Chemical reaction on silicon carbide wafer (0 0 0 1 and 0 0 0 −1) with water molecules in nanoscale polishing
Zige Tian, Jing Lü, Qiufa Luo, Xipeng Xu
Topics & Concepts
WaferPolishingMaterials scienceSilicon carbideChemical-mechanical planarizationNanoscopic scaleSiliconNano-Amorphous solidMoleculeDiamondMachiningChemical engineeringNanotechnologyComposite materialMetallurgyChemistryCrystallographyOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchMetal and Thin Film Mechanics