Litcius/Paper detail

Computational fluid dynamics modeling of a new high-pressure chemical vapor deposition reactor design

Pedram Yousefian, Siddha Pimputkar

2021Journal of Crystal Growth14 citationsDOI

Topics & Concepts

Chemical vapor depositionSusceptorMetalorganic vapour phase epitaxyNitrideChemistryThin filmDeposition (geology)Atmospheric pressureVolumetric flow rateAnalytical Chemistry (journal)Materials scienceNanotechnologyThermodynamicsEnvironmental chemistryOrganic chemistryMeteorologyLayer (electronics)PhysicsSedimentPaleontologyEpitaxyBiologyPlasma Diagnostics and ApplicationsElectrohydrodynamics and Fluid DynamicsPlasma Applications and Diagnostics