Impact of dislocation density on the ferroelectric properties of ScAlN grown by molecular beam epitaxy
Ding Wang, Ping Wang, Shubham Mondal, Yixin Xiao, Mingtao Hu, Zetian Mi
Abstract
We report on the effect of dislocation density on the ferroelectric properties of single-crystalline ScAlN thin films grown by molecular beam epitaxy. Wurtzite phase and atomically smooth ScAlN films have been grown on bulk GaN, GaN on sapphire, and GaN on Si substrates with dislocation densities ranging from ∼107 to 1010 cm−2. Despite the significant difference in dislocation density, ferroelectricity is observed in all three samples. The presence of high densities of dislocations, however, results in enhanced asymmetric P–E loops and overestimated remnant polarization values. Further measurements show that the leakage current and breakdown strength can be improved with decreasing dislocation density. Detailed studies suggest that trapping/detrapping assisted transport is the main leakage mechanism in epitaxial ferroelectric ScAlN films. This work sheds light on the essential material quality considerations for tuning the ferroelectric property of ScAlN toward integration with mainstream semiconductor platforms, e.g., Si, and paves the way for next-generation electronics, optoelectronics, and piezoelectronics.