Thermal atomic layer etching of cobalt using plasma chlorination and chelation with hexafluoroacetylacetone
Yong‐Jae Kim, Somin Chae, Heeju Ha, Hyeongwu Lee, Sangheon Lee, Heeyeop Chae, Sangheon Lee, Heeyeop Chae
Topics & Concepts
CobaltChelationChemistryAdsorptionInorganic chemistryEtching (microfabrication)Reaction rate constantThermal decompositionInductively coupled plasmaLayer (electronics)Analytical Chemistry (journal)KineticsPlasmaPhysical chemistryOrganic chemistryPhysicsQuantum mechanicsSemiconductor materials and devicesElectronic and Structural Properties of OxidesDiamond and Carbon-based Materials Research