Study on the effect of process parameters and removal behavior of single-crystal SiC polishing based on a photocatalytic fixed polishing plate
Lin Chen, Xie Jilong, Jiabin Lu, Qiusheng Yan
Topics & Concepts
PolishingPhotocatalysisSingle crystalMaterials scienceChemical-mechanical planarizationProcess (computing)OpticsComposite materialCrystallographyComputer scienceChemistryPhysicsCatalysisBiochemistryOperating systemAdvanced Surface Polishing TechniquesAdvanced ceramic materials synthesisAnodic Oxide Films and Nanostructures