Litcius/Paper detail

Excellent diffusion barrier property of amorphous NbMoTaW medium entropy alloy thin films used in Cu/Si Connect System

Kun Hu, Qiang Hu, Xiandong Xu, S.H. Chen, Jiang Ma, Wanqing Dong

2022Vacuum20 citationsDOI

Topics & Concepts

Materials scienceAmorphous solidDiffusion barrierAnnealing (glass)MicrostructureGrain boundaryAlloySputter depositionThin filmSputteringGrain boundary diffusion coefficientComposite materialAnalytical Chemistry (journal)NanotechnologyCrystallographyChemistryLayer (electronics)ChromatographyHigh Entropy Alloys StudiesHigh-Temperature Coating BehaviorsAdvanced materials and composites
Excellent diffusion barrier property of amorphous NbMoTaW medium entropy alloy thin films used in Cu/Si Connect System | Litcius