First-principles molecular dynamics investigation of ceria/silica sliding interface toward functional materials design for chemical mechanical polishing process
Tasuku Onodera, Hitomi Takahashi, Satoyuki Nomura
Topics & Concepts
Chemical-mechanical planarizationMaterials scienceWaferSilicon carbideMolecular dynamicsPolishingChemical bondSiliconMoleculeDensity functional theoryChemical physicsComposite materialNanotechnologyChemical engineeringComputational chemistryChemistryMetallurgyOrganic chemistryEngineeringAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications