Removal mechanism of the chemical products layer on single-crystal sapphire surface in magneto-rheological polishing with Fe3O4/SiO2 core-shell abrasives
Quan Zhai, Wenjie Zhai, Tianhe Deng
Topics & Concepts
Shearing (physics)Materials sciencePolishingComposite materialSapphireChemical-mechanical planarizationExtrusionScratchLayer (electronics)RheologySurface layerOpticsLaserPhysicsAdvanced Surface Polishing TechniquesAdvanced machining processes and optimizationDiamond and Carbon-based Materials Research