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Aerosol Jet Printing of Silver Lines with A High Aspect Ratio on A Heated Silicon Substrate

Alexey Efimov, Pavel V. Arsenov, Denis Kornyushin, Anna A. Lizunova, И. А. Волков, Victor Ivanov

2020Materials34 citationsDOIOpen Access PDF

Abstract

In this work, we studied the formation of conductive silver lines with high aspect ratios (AR = thickness/width) > 0.1 using the modernized method of aerosol jet printing on a heated silicon substrate. The geometric (AR) and electrical (resistivity) parameters of the formed lines were investigated depending on the number of printing layers (1–10 layers) and the temperature of the substrate (25–300 °C). The AR of the lines increased as the number of printing layers and the temperature of the substrate increased. An increase in the AR of the lines with increasing substrate temperature was associated with a decrease in the ink spreading as a result of an increase in the rate of evaporation of nano-ink. Moreover, with an increase in the substrate temperature of more than 200 °C, a significant increase in the porosity of the formed lines was observed, and as a result, the electrical resistivity of the lines increased significantly. Taking into account the revealed regularities, it was demonstrated that the formation of silver lines with a high AR > 0.1 and a low electrical resistivity of 2–3 μΩ∙cm is advisable to be carried out at a substrate temperature of about 100 °C. The adhesion strength of silver films formed on a heated silicon substrate is 2.8 ± 0.9 N/mm2, which further confirms the suitability of the investigated method of aerosol jet printing for electronic applications.

Topics & Concepts

Substrate (aquarium)SiliconMaterials scienceElectrical resistivity and conductivityEvaporationJet (fluid)Electrical conductorAerosolComposite materialOptoelectronicsChemistryElectrical engineeringOrganic chemistryPhysicsGeologyEngineeringOceanographyThermodynamicsNanomaterials and Printing TechnologiesElectrohydrodynamics and Fluid DynamicsGold and Silver Nanoparticles Synthesis and Applications
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