In situ capture of spatter signature of SLM process using maximum entropy double threshold image processing method based on genetic algorithm
Dekun Yang, Hui Li, Sheng Liu, Changhui Song, Yongqiang Yang, Shengnan Shen, Junwen Lu, Zefeng Liu, Yilin Zhu
Topics & Concepts
In situSignature (topology)AlgorithmComputer scienceImage processingEntropy (arrow of time)Principle of maximum entropyProcess (computing)Artificial intelligencePattern recognition (psychology)Image (mathematics)MathematicsPhysicsGeometryMeteorologyOperating systemQuantum mechanicsAdditive Manufacturing Materials and ProcessesWelding Techniques and Residual StressesIndustrial Vision Systems and Defect Detection