Mechanisms of colloidal ceria contamination and cleaning during oxide post CMP cleaning
Samrina Sahir, Nagendra Prasad Yerriboina, So-Young Han, Tae‐Gon Kim, Niraj Mahadev, Jin-Goo Park
Topics & Concepts
Data scrubbingMaterials scienceHydrofluoric acidChemical engineeringAdhesionColloidPolishingContaminationChemical-mechanical planarizationOxideSlurryParticle sizeWet cleaningParticle (ecology)NanotechnologyMetallurgyChemistryComposite materialWaste managementEngineeringOrganic chemistryGeologyBiologyOceanographyEcologyAdvanced Surface Polishing TechniquesMetal Extraction and BioleachingMinerals Flotation and Separation Techniques