The role of carboxylic acids on nanoparticle removal in post CMP cleaning process for cobalt interconnects
Lifei Zhang, Xinchun Lu, Ahmed Busnaina
Topics & Concepts
CobaltZeta potentialChemical-mechanical planarizationPassivationNanoparticleCobalt oxideChemical engineeringDissolutionCarboxylic acidMaterials scienceCitric acidAdsorptionYield (engineering)WettingParticle (ecology)OxideChemistryNanotechnologyInorganic chemistryOrganic chemistryPolymer chemistryComposite materialMetallurgyLayer (electronics)OceanographyEngineeringGeologyCopper Interconnects and ReliabilitySemiconductor materials and devicesElectrodeposition and Electroless Coatings