Litcius/Paper detail

Channel Engineering Assisted Performance Enhancement of Metal Gate Sub-10nm Ballistic SiNWFET for Futuristic Device Applications

Bhoop Singh, Karamvir Singh, Sandeep Sharma, Ravi Kumar, B. Prasad, Dinesh Kumar

2021Silicon11 citationsDOI

Topics & Concepts

Materials scienceNanowireOptoelectronicsSiliconField-effect transistorTechnology CADConductanceEngineering physicsTransistorMOSFETNanometreNode (physics)Drain-induced barrier loweringSemiconductorNanotechnologyElectrical engineeringCondensed matter physicsEngineeringPhysicsVoltageEngineering drawingCADStructural engineeringComposite materialAdvancements in Semiconductor Devices and Circuit DesignSemiconductor materials and devicesIntegrated Circuits and Semiconductor Failure Analysis
Channel Engineering Assisted Performance Enhancement of Metal Gate Sub-10nm Ballistic SiNWFET for Futuristic Device Applications | Litcius