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Thermal stability of ultra thin Zr-B-N films as diffusion barrier between Cu and Si

Yongpeng Meng, Zhongxiao Song, Y.H. Li, Dan Qian, Wei Hu, Kewei Xu

2020Applied Surface Science15 citationsDOI

Topics & Concepts

Diffusion barrierAmorphous solidMaterials scienceAnnealing (glass)Thermal stabilityThin filmSputter depositionSputteringElectrical resistivity and conductivityAnalytical Chemistry (journal)Chemical engineeringCrystallographyNanotechnologyComposite materialChemistryLayer (electronics)Electrical engineeringEngineeringChromatographyCopper Interconnects and ReliabilitySemiconductor materials and devicesSemiconductor materials and interfaces
Thermal stability of ultra thin Zr-B-N films as diffusion barrier between Cu and Si | Litcius