Effect of complexing agent on ceria particle removal in post-STI CMP cleaning process
Yan Mei, Baimei Tan, Shihao Zhang, Wei Li, Jinbo Ji, Zhi Liu, Li Huang, Fangyuan Wang, Xiaolong Wang, Haoyu Du
Topics & Concepts
X-ray photoelectron spectroscopyChemical-mechanical planarizationEthylenediamineZeta potentialChemistryChemical engineeringParticle (ecology)Silicon dioxideDesorptionChelationInorganic chemistryMaterials scienceNanotechnologyAdsorptionNanoparticleLayer (electronics)Organic chemistryGeologyEngineeringOceanographyAdvanced Surface Polishing TechniquesMetal Extraction and BioleachingMinerals Flotation and Separation Techniques