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Effect of complexing agent on ceria particle removal in post-STI CMP cleaning process

Yan Mei, Baimei Tan, Shihao Zhang, Wei Li, Jinbo Ji, Zhi Liu, Li Huang, Fangyuan Wang, Xiaolong Wang, Haoyu Du

2022Colloids and Surfaces A Physicochemical and Engineering Aspects27 citationsDOI

Topics & Concepts

X-ray photoelectron spectroscopyChemical-mechanical planarizationEthylenediamineZeta potentialChemistryChemical engineeringParticle (ecology)Silicon dioxideDesorptionChelationInorganic chemistryMaterials scienceNanotechnologyAdsorptionNanoparticleLayer (electronics)Organic chemistryGeologyEngineeringOceanographyAdvanced Surface Polishing TechniquesMetal Extraction and BioleachingMinerals Flotation and Separation Techniques
Effect of complexing agent on ceria particle removal in post-STI CMP cleaning process | Litcius