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28-nm FD-SOI CMOS RF Figures of Merit Down to 4.2 K

Lucas Nyssens, Arka Halder, Babak Kazemi Esfeh, N. Planes, Denis Flandre, Valeriya Kilchytska, Jean‐Pierre Raskin

2020IEEE Journal of the Electron Devices Society36 citationsDOIOpen Access PDF

Abstract

This work presents a detailed RF characterization of 28-nm FD-SOI nMOSFETs at cryogenic temperatures down to 4.2 K. Two main RF Figures of Merit (FoMs), i.e., current-gain cutoff frequency (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub> ) and maximum oscillation frequency (f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> ), as well as parasitic elements of the small-signal equivalent circuit, are extracted from the measured S-parameters. An improvement of up to ~130 GHz in f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">t</sub> and ~75 GHz in f <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">max</sub> is observed for the shortest device (25 nm) at low temperature. The behavior of RF FoMs versus temperature is discussed in terms of small-signal equivalent circuit elements, both intrinsic and extrinsic (parasitics). This study suggests 28-nm FD-SOI nMOSFETs as a good candidate for future cryogenic applications down to 4.2 K and clarifies the origin and limitations of the performance.

Topics & Concepts

Figure of meritParasitic extractionCMOSSilicon on insulatorCutoff frequencyPhysicsElectrical engineeringOptoelectronicsTopology (electrical circuits)Materials scienceEngineeringSiliconSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit DesignRadio Frequency Integrated Circuit Design
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