Dielectric Gene Tailoring and Interfacial Polarization Relaxation in Mo─Fe Bimetallic Carbide for Low‐Frequency Electromagnetic Response
Jixing Bai, Luyang Li, Ke Pei, Qi Cao, Xiangzhou Yuan, Miao Jiang, Zhuang Ma, Renchao Che, Mao‐Sheng Cao
Abstract
Abstract Hetero‐interface engineering and dielectric gene tailoring play a crucial role in regulating the electromagnetic response of materials, especially in customizing the electromagnetic wave absorption (EMWA) at specific frequencies. Herein, the polarization dielectric genes at the hetero‐interface are tailored by changing the Mo/Fe ratio in 1D bimetallic carbide nanorods, and regulating the electromagnetic characteristics of the interface. Density functional theory calculations and electron holography combined indicate that the type change of the electric dipole at the hetero‐interface significantly affects the charge separation and localization effect at the interface, successfully regulating the relaxation time, achieving dielectric relaxation loss in the C band, and ultimately, the reflection loss of the material reaches −49.5 dB at 2.5 mm, and 90% EMWA is achieved at 3.44 GHz . Moreover, the coating of carbon shells endows the material with exceptional environmental adaptability (Ecorr = −0.146 V). This work provides novel insights into the precisely directional regulation of interface polarization relaxation and offers new strategies for the functional integration of high‐performance low‐frequency absorption and environmental tolerance materials.