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Total ionizing dose hardness analysis of transistors in commercial 180 nm CMOS technology

Mukesh Kumar, Jagpal Singh Ubhi, Sanjeev Basra, Anuj Chawla, H. S. Jatana

2021Microelectronics Journal23 citationsDOI

Topics & Concepts

NMOS logicPMOS logicGate oxideMaterials scienceThreshold voltageCMOSAbsorbed doseOptoelectronicsDrain-induced barrier loweringTransistorRadiation hardeningElectrical engineeringMetal gateRadiationVoltageOpticsPhysicsEngineeringRadiation Effects in ElectronicsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit Design
Total ionizing dose hardness analysis of transistors in commercial 180 nm CMOS technology | Litcius