Aluminum tantalum oxide thin films deposited at low temperature by pulsed direct current reactive magnetron sputtering for dielectric applications
Richard Drevet, Pavel Souček, Pavel Mareš, Pavel Ondračka, Martin Dubau, Tamás Kolonits, Zsolt Czigány, Katalin Balázsi, Petr Vašina
Topics & Concepts
TantalumMaterials scienceThin filmSputter depositionAmorphous solidOxideSputteringDielectricChemical vapor depositionDeposition (geology)Analytical Chemistry (journal)MetallurgyChemistryNanotechnologyOptoelectronicsCrystallographyBiologyPaleontologyChromatographySedimentSemiconductor materials and devicesZnO doping and propertiesMetal and Thin Film Mechanics