Enhancement of discharge and deposition rate by imposed pulse current during the cathodic arc deposition of ta-C films
Hu Jian, Xiubo Tian, Hongye Liu, Chunzhi Gong, Benfu Wang
Topics & Concepts
Deposition (geology)EvaporationArc (geometry)Cathodic arc depositionCurrent (fluid)Materials scienceSubstrate (aquarium)Direct currentAnalytical Chemistry (journal)Cathodic protectionCarbon fibersChemistryComposite materialElectrodeVoltageElectrochemistryElectrical engineeringComposite numberEnvironmental chemistryMathematicsPaleontologyGeologyPhysicsThermodynamicsBiologySedimentOceanographyEngineeringGeometryPhysical chemistryDiamond and Carbon-based Materials ResearchMetal and Thin Film MechanicsSemiconductor materials and devices