Atomic layer chemical vapor deposition of SiO2 thin films using a chlorine-free silicon precursor for 3D NAND applications
GeonHo Baek, Ji-hoon Baek, Hye-Mi Kim, Seung-Hwan Lee, Yusung Jin, Hyung Soon Park, Deok-Sin Kil, Sangho Kim, Yongjoo Park, Jin‐Seong Park
Topics & Concepts
Materials scienceAtomic layer depositionChemical vapor depositionSilaneChlorineSiliconAnalytical Chemistry (journal)Layer (electronics)Thin filmImpurityDeposition (geology)Chemical engineeringNanotechnologyChemistryOptoelectronicsOrganic chemistryMetallurgyComposite materialSedimentEngineeringBiologyPaleontologySemiconductor materials and devicesElectronic and Structural Properties of OxidesZnO doping and properties