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Memory Behavior of an Al<sub>2</sub>O<sub>3</sub> Gate Dielectric Non-Volatile Field-Effect Transistor

Yue Peng, Wenwu Xiao, Genquan Han, Yan Liu, Fenning Liu, Chen Liu, Yichun Zhou, Nan Yang, Ni Zhong, Chun‐Gang Duan, Yue Hao

2020IEEE Electron Device Letters26 citationsDOI

Abstract

Non-volatile field-effect transistor (FET) with amorphous Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> dielectric is demonstrated on Si substrate, which is enabled by the voltage modulation of the oxygen vacancy and negative charge dipoles in gate insulator. Ferroelectric-like behavior in TaN/Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> /Si <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.70</sub> Ge <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">0.30</sub> stacks with different thicknesses of Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> is proved by polarization-voltage tests, positive-up and negative-down tests, piezoresponse force microscopy, and electrical measurements. The Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> capacitors attain over 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">8</sup> cycles' endurance of polarization versus voltage measurement. A 6.5 nm-thick Al <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> O <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">3</sub> non-volatile FET achieves a memory window above 0.6 V under ±2 V at 100 ns program/erase (P/E) condition, over 10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">4</sup> cycles P/E endurance, and >10 <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">5</sup> s data retention at room temperature.

Topics & Concepts

FerroelectricityDielectricPhysicsOptoelectronicsAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesSemiconductor materials and devices
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