Litcius/Paper detail

A Monolithic 3-D Integration of RRAM Array and Oxide Semiconductor FET for In-Memory Computing in 3-D Neural Network

Jixuan Wu, Fei Mo, Takuya Saraya, Toshiro Hiramoto, Masaharu Kobayashi

2020IEEE Transactions on Electron Devices40 citationsDOI

Abstract

We have monolithically integrated resistance random access memory (RRAM) array with oxide semiconductor channel access transistor in 3-D stack, achieved uniform memory characteristics of 1T1R cells at each layer, and demonstrated basic functionality of XNOR operation as in-memory computing for binary neural network (BNN) artificial intelligence (AI) applications. The integrated TiN/Ti/HfO <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sub> /Ti stack RRAM shows high on/off ratio with stable retention and endurance properties. The indium gallium zinc oxide (IGZO) channel field-effect transistor (FET) works as an access transistor, which realized the low-temperature process, high mobility, and high drive current for RRAM. With the peripheral circuit, we demonstrate the XNOR operation using a pair of 1T1R cells. The impact of RRAM bit error rate on neural network is also investigated, which indicates the property of error-resilience in BNN. The 3-D neural network built by this architecture has high potential to enable area-efficient, low-power, and low-latency computing.

Topics & Concepts

Resistive random-access memoryXNOR gateMaterials scienceTransistorArtificial neural networkNon-volatile memoryElectronic engineeringOptoelectronicsComputer scienceElectrical engineeringEngineeringArtificial intelligenceVoltageAdvanced Memory and Neural ComputingFerroelectric and Negative Capacitance DevicesSemiconductor materials and devices