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E-Mode AlN/GaN HEMTs on Si With 80.4% PAE at 3.6 GHz for Low-Supply-Voltage RF Power Applications

Guangjie Gao, Zhihong Liu, Lu Hao, Fang Zhang, Xiaojin Chen, Hanghai Du, Weichuan Xing, Hong Zhou, Jincheng Zhang, Yue Hao

2024IEEE Electron Device Letters13 citationsDOI

Abstract

Enhancement-mode (E-mode) AlN/GaN high electron mobility transistors (HEMTs) with a 160-nm T- shape recessed gate on a silicon substrate were fabricated. The fabricated device has a <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {TH}}$ </tex-math></inline-formula> of +0.35 V, and shows a maximum drain current (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${I}_{\text {DMAX}}\text {)}$ </tex-math></inline-formula> of 1.58 A/mm, a low on- resistance (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {ON}}\text {)}$ </tex-math></inline-formula> of <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$1.8~\Omega \cdot $ </tex-math></inline-formula> mm, and a peak transconductance (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${G}_{\text {MMAX}}\text {)}$ </tex-math></inline-formula> over 580 mS/mm. A cut-off frequency (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${f}_{\text {T}}\text {)}$ </tex-math></inline-formula> of 85 GHz and a maximum oscillation frequency (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${f}_{\max }\text {)}$ </tex-math></inline-formula> of 75 GHz were obtained. Load pull continuous-wave (CW) power sweep measurement at 3.6 GHz demonstrated a peak power-added-efficiency (PAE) of 71.4% and a saturated output power density (<inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${P}_{\text {out}}\text {)}$ </tex-math></inline-formula> of 0.70 W/mm at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}}=6$ </tex-math></inline-formula> V. At 3.6 GHz pulsed wave (PW) power sweep at <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${V}_{\text {DS}}=6$ </tex-math></inline-formula> V the device demonstrated an 80.4% PAE and 0.5 W/mm associated <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${P}_{\text {out}}$ </tex-math></inline-formula>. These results promises the great potential of E-mode AlN/GaN HEMTs with gate recess in the applications of low supply voltage RF power applications.

Topics & Concepts

Materials scienceOptoelectronicsGallium nitrideRadio frequencyVoltageWide-bandgap semiconductorPower (physics)Electrical engineeringMode (computer interface)TransistorElectronic engineeringEngineeringComputer sciencePhysicsNanotechnologyOperating systemQuantum mechanicsLayer (electronics)GaN-based semiconductor devices and materialsRadio Frequency Integrated Circuit DesignAcoustic Wave Resonator Technologies
E-Mode AlN/GaN HEMTs on Si With 80.4% PAE at 3.6 GHz for Low-Supply-Voltage RF Power Applications | Litcius