Suppressing channel-shortening effect of self-aligned coplanar Al-doped In-Sn-Zn-O TFTs using Mo-Al alloy source/drain electrode as Cu diffusion barrier
Wooseok Jeong, Jörg Winkler, Hennrik Schmidt, Kwang‐Heum Lee, Sang‐Hee Ko Park
Topics & Concepts
Materials scienceAnnealing (glass)Thin-film transistorDiffusion barrierAlloyDopingBarrier layerOptoelectronicsOxideDiffusionAnalytical Chemistry (journal)NanotechnologyMetallurgyLayer (electronics)ChemistryPhysicsThermodynamicsChromatographyThin-Film Transistor TechnologiesZnO doping and propertiesSilicon and Solar Cell Technologies