Growth kinetics of the ferroelectric Al-doped HfO2 thin films via synergistic effect of various essential factors
Yanhu Mao, Wanli Zhang, Lian Cui, Minghua Tang, Pengyu Su, Xiaojiang Long, Gang Li, Yongguang Xiao, Shaoan Yan
Topics & Concepts
Materials scienceKineticsDopingFerroelectricityChemical engineeringThin filmNanotechnologyOptoelectronicsDielectricQuantum mechanicsPhysicsEngineeringFerroelectric and Negative Capacitance DevicesSemiconductor materials and devicesMXene and MAX Phase Materials