Mixed-ligand zinc-oxoclusters: efficient chemistry for high resolution nanolithography
Neha Thakur, Roland Bliem, Iacopo Mochi, Michaela Vockenhuber, Yasin Ekinci, Sonia Castellanos
Abstract
The combined reactivity of methacrylate and trifluoroacetate ligands make zinc-oxoclusters pattern 22–50 nm lines with high sensitivity by EUV Lithography.
Topics & Concepts
NanolithographyZincExtreme ultraviolet lithographyMaterials scienceReactivity (psychology)LithographyLigand (biochemistry)Dip-pen nanolithographyNanotechnologyMethacrylateResolution (logic)High resolutionOptoelectronicsChemistryPolymerizationPolymerFabricationMetallurgyComputer scienceMedicineRemote sensingPathologyAlternative medicineBiochemistryGeologyArtificial intelligenceComposite materialReceptorNanofabrication and Lithography TechniquesAdvancements in Photolithography TechniquesForce Microscopy Techniques and Applications