Synthesis and characterization of the rheological behavior of MR fluid for polishing silicon wafer using double-disc chemical-assisted magneto-rheological finishing process
Mayank Srivastava, Pulak M. Pandey, Kuldeep, G.A. Basheed, R.P. Pant
Topics & Concepts
RheologyPolishingMaterials scienceWaferCharacterization (materials science)Magnetorheological fluidMagnetoSiliconProcess (computing)Chemical-mechanical planarizationComposite materialNanotechnologyMechanical engineeringMagnetic fieldMagnetOptoelectronicsComputer sciencePhysicsQuantum mechanicsEngineeringOperating systemVibration Control and Rheological FluidsCharacterization and Applications of Magnetic NanoparticlesAdvanced Surface Polishing Techniques