A Bulk Full-Gate SOI-LDMOS Device With Bulk Channel and Electron Accumulation Effect
Weizhong Chen, Haifeng Qin, Yuan-Xi Huang, Yi Huang, Zhengsheng Han
Abstract
A novel LDMOS featuring bulk full gate (BFG) with bulk channel and electron accumulation effect, named BFG-LDMOS, is proposed and investigated. The BFG includes bulk gate oxide (BGO) that is inserted in the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift and the full gate (FG) that is formed by the wide open base transistor (P-body/ <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift/P <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> ). The gate potential is extended in the gate- <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift-drain (GND) region, and thus, the bulk channel of the P-body and electron accumulation effect of the <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift in the source- <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift-drain (SND) region is achieved, which significantly reduces the specific ON-resistance ( <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {ON,sp}}$ </tex-math></inline-formula> ). In addition, the P-body, <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift, and N <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">+</sup> drain are divided by the BGO, and the P-body/ <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${N}$ </tex-math></inline-formula> -drift junction (PN1) sustains the breakdown electric field for both sides, which guarantees the breakdown voltage (BV) like conventional LDMOS. The 3-D simulation results indicate that the BV and <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">${R}_{\text {ON,sp}}$ </tex-math></inline-formula> are 249 V and 2.93 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\text{m}\Omega \cdot $ </tex-math></inline-formula> cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> for the proposed BFG-LDMOS, respectively, and the Baliga’s figure of merit (FoM) is high up to 21 MW/cm <sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">2</sup> , which breaks through the silicon limit of the reduced surface field (RESURF).