Litcius/Paper detail

Atomic layer deposition of α-Al2O3 from trimethylaluminum and H2O: Effect of process parameters and plasma excitation on structure development

Lauri Aarik, Carl‐Thomas Piller, Jüri Raud, Rasmus Talviste, Indrek Jõgi, Jaan Aarik

2023Journal of Crystal Growth12 citationsDOI

Topics & Concepts

Atomic layer depositionAmorphous solidCrystallizationAnalytical Chemistry (journal)ChemistryPlasmaAluminiumLayer (electronics)Thin filmAluminium oxideDeposition (geology)Materials scienceChemical engineeringNanotechnologyCrystallographyMetallurgyOrganic chemistryEngineeringQuantum mechanicsSedimentPhysicsBiologyPaleontologySemiconductor materials and devicesZnO doping and propertiesElectronic and Structural Properties of Oxides
Atomic layer deposition of α-Al2O3 from trimethylaluminum and H2O: Effect of process parameters and plasma excitation on structure development | Litcius