High-performance Ge/Si electro-absorption optical modulator up to 85°C and its highly efficient photodetector operation
Junichi Fujikata, Masataka Noguchi, Riku Katamawari, Kyosuke Inaba, Hideki Ono, Daisuke Shimura, Yosuke Onawa, Hiroki Yaegashi, Yasuhiko Ishikawa
Abstract
We studied a high-speed Ge/Si electro-absorption optical modulator (EAM) evanescently coupled with a Si waveguide of a lateral p-n junction for a high-bandwidth optical interconnect over a wide range of temperatures from 25 °C to 85 °C. We demonstrated 56 Gbps high-speed operation at temperatures up to 85 °C. From the photoluminescence spectra, we confirmed that the bandgap energy dependence on temperature is relatively small, which is consistent with the shift in the operation wavelengths with increasing temperature for a Ge/Si EAM. We also demonstrated that the same device operates as a high-speed and high-efficiency Ge photodetector with the Franz-Keldysh (F-K) and avalanche-multiplication effects. These results demonstrate that the Ge/Si stacked structure is promising for both high-performance optical modulators and photodetectors integrated on Si platforms.