Efficient access to non-damaging GaN (0001) by inductively coupled plasma etching and chemical–mechanical polishing
Qiubo Li, Shouzhi Wang, Lei Liu, Kepeng Song, Jiaoxian Yu, Guodong Wang, Jingliang Liu, Peng Cui, Siheng Chen, Defu Sun, Zhongxin Wang, Xiangang Xu, Lei Zhang
Topics & Concepts
Inductively coupled plasmaPolishingChemical-mechanical planarizationEtching (microfabrication)PlasmaMaterials sciencePlasma etchingInductively coupled plasma atomic emission spectroscopyMetallurgyNanotechnologyOptoelectronicsLayer (electronics)PhysicsQuantum mechanicsGaN-based semiconductor devices and materialsSemiconductor materials and devicesAdvancements in Semiconductor Devices and Circuit Design