Influence of oxygen precursors on atomic layer deposition of HfO2 and hafnium-titanium oxide films: Comparison of O3- and H2O-based processes
Lauri Aarik, Tõnis Arroval, Hugo Mändar, Raul Rammula, Jaan Aarik
Topics & Concepts
Atomic layer depositionMonoclinic crystal systemAmorphous solidAnataseAnalytical Chemistry (journal)TitaniumMaterials sciencePhase (matter)HafniumChlorineTetragonal crystal systemOrthorhombic crystal systemOxygenSubstrate (aquarium)ChemistryLayer (electronics)ZirconiumMetallurgyCrystallographyNanotechnologyCrystal structureCatalysisEnvironmental chemistryBiochemistryOceanographyPhotocatalysisOrganic chemistryGeologySemiconductor materials and devicesElectronic and Structural Properties of OxidesFerroelectric and Negative Capacitance Devices