Investigate on material removal of 3C-SiC crystals in nano-polishing via molecular dynamics
Huan Liu, Pengyue Zhao, Dongxu Wu, Duo Li, Shunbo Wang, Xifeng Gao, Dawei Wang, Xin Wu, Shujun Huang, Jiubin Tan
Topics & Concepts
PolishingMaterials scienceNano-MachiningMolecular dynamicsResidual stressWork (physics)Phase (matter)Chemical-mechanical planarizationStress (linguistics)Mechanism (biology)Crystal (programming language)Composite materialNanotechnologyMechanical engineeringMetallurgyComputer scienceChemistryComputational chemistryPhilosophyEngineeringEpistemologyOrganic chemistryProgramming languageLinguisticsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchMetal and Thin Film Mechanics