Fluorinated β-diketonate complexes M(tfac)<sub>2</sub>(TMEDA) (M = Fe, Ni, Cu, Zn) as precursors for the MOCVD growth of metal and metal oxide thin films
Christian Stienen, Julian Grahl, Christoph Wölper, Stephan Schulz, Georg Bendt
Abstract
Novel trifluoroacetylacetonate complexes M(tfac) 2 ·TMEDA (M = Fe, Ni, Cu, Zn) were used as precursors for the MOCVD growth of metal and metal oxide thin films.
Topics & Concepts
TetramethylethylenediamineCalcinationMetalChemistryMetalorganic vapour phase epitaxyOxideNon-blocking I/OAcetylacetoneInorganic chemistryMedicinal chemistryOrganic chemistryEpitaxyCatalysisLayer (electronics)Copper Interconnects and ReliabilityOrganometallic Complex Synthesis and CatalysisMagnetism in coordination complexes