Photolithography-assisted precise patterning of nanocracks for ultrasensitive strain sensors
Junshan Liu, Hongji Guo, Ming Li, Chi Zhang, Yongzhi Chu, Lixuan Che, Zhihao Zhang, Rui Li, Jining Sun, Yao Lu
Abstract
A photolithography-assisted nanocrack patterning method is reported to precisely define the nanocrack pattern in metal films. This method is used to fabricate an ultrasensitive strain sensor with a gauge factor of ∼20 000 in 0–1.2% strain range.
Topics & Concepts
PhotolithographyGauge factorStrain (injury)Materials scienceStrain gaugeNanotechnologyOptoelectronicsFabricationComposite materialBiologyMedicineAnatomyPathologyAlternative medicineAdvanced Sensor and Energy Harvesting MaterialsAdvanced MEMS and NEMS TechnologiesAcoustic Wave Resonator Technologies