Mechanical wear behavior between CeO2(100), CeO2(110), CeO2(111), and silicon studied through atomic force microscopy
Lile Xie, Jie Cheng, Tongqing Wang, Xinchun Lu
Topics & Concepts
Adhesive wearMaterials scienceChemical-mechanical planarizationCerium oxideSiliconScanning electron microscopeAtomic force microscopyCeriumTribologyPolishingComposite materialOxideNanotechnologyMetallurgyAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchForce Microscopy Techniques and Applications