Comparative study of structural and stoichiometric properties of titanium nitride films deposited by cathodic cage plasma deposition and magnetron sputtering
Igor Oliveira Nascimento, M. Naeem, Roseana-de-Almeida Freitas, Rubens M. Nascimento, Bartolomeu C. Viana, Rômulo Ríbeiro Magalhães de Sousa, Michelle Cequeira Feitor, Javed Iqbal, T. H. C. Costa
Topics & Concepts
StoichiometryMaterials scienceTinSputter depositionTitanium nitrideDeposition (geology)TitaniumNitrideSputteringLayer (electronics)Thin filmMetallurgyComposite materialNanotechnologyChemistryBiologyOrganic chemistrySedimentPaleontologyMetal and Thin Film MechanicsGaN-based semiconductor devices and materialsZnO doping and properties