Y-doped HfO2 deposited by atomic layer deposition using a cocktail precursor for DRAM capacitor dielectric application
Jenam Kim, Byung Seok Kim, Aejin Lee, Dong Hee Han, Ji Hyeon Hwang, Youngjin Kim, Ki-Chang Song, Hansol Oh, Sangho Kim, Yongjoo Park, Woojin Jeon
Topics & Concepts
Materials scienceDielectricMonoclinic crystal systemTetragonal crystal systemHigh-κ dielectricThin filmDopingDopantCapacitorAnalytical Chemistry (journal)Atomic layer depositionDielectric lossOptoelectronicsNanotechnologyCrystal structureCrystallographyElectrical engineeringOrganic chemistryVoltageChemistryEngineeringSemiconductor materials and devicesFerroelectric and Negative Capacitance DevicesAdvanced Memory and Neural Computing