Inhibitor-free area-selective atomic layer deposition of SiO2 through chemoselective adsorption of an aminodisilane precursor on oxide versus nitride substrates
Jeong‐Min Lee, Jinseon Lee, Hongjun Oh, Jiseong Kim, Bonggeun Shong, Tae Joo Park, Woo‐Hee Kim, Woo‐Hee Kim
Topics & Concepts
Atomic layer depositionEtching (microfabrication)SelectivityAdsorptionDeposition (geology)NanotechnologyOxideDisilaneMonolayerNitrideMaterials scienceLayer (electronics)Buffered oxide etchSelf-assembled monolayerNanostructureChemical engineeringChemistrySiliconOrganic chemistryOptoelectronicsReactive-ion etchingCatalysisSedimentEngineeringPaleontologyBiologySemiconductor materials and devicesElectronic and Structural Properties of OxidesFerroelectric and Negative Capacitance Devices