Hydrogen plasma characteristics in a microwave chemical vapor deposition chamber
Di Yang, Guo Li, Bisheng Wang, Shuai Jin, Jiaqi Zhu, Ming Zhai
Topics & Concepts
PlasmaMicrowaveHydrogenAtomic physicsMultiphysicsChemistryElectric fieldElectron temperatureElectron densityDeposition (geology)Analytical Chemistry (journal)Chemical vapor depositionIon sourceCapacitively coupled plasmaPlasma-enhanced chemical vapor depositionElectronMaterials scienceInductively coupled plasmaThermodynamicsOptoelectronicsPhysicsPaleontologyBiologyFinite element methodSedimentQuantum mechanicsChromatographyOrganic chemistryPlasma Diagnostics and ApplicationsMetal and Thin Film MechanicsCatalytic Processes in Materials Science