Regulable crack patterns for the fabrication of high-performance transparent EMI shielding windows
Yongmao Guan, Liqing Yang, Chao Chen, Rui Wan, Chen Guo, Pengfei Wang
Abstract
Crack pattern-based metal grid film is an ideal candidate material for transparent electromagnetic interference shielding optical windows. However, achieving crack patterns with narrow grid spacing, small wire width, and high connectivity remains challenging. Herein, an aqueous acrylic colloidal dispersion was developed as a crack precursor for preparing crack patterns. The ratio of hard monomers in the precursor, the coating thickness, and the drying mediation strategy were systematically varied to control the spacing and width of the crack patterns. The resulting dense and narrow crack patterns served as sacrificial templates for the fabrication of patterning metal grid films on transparent substrates, intended for optoelectronic applications. These films demonstrated excellent optoelectronic properties (82.7% transmission at 550 nm visible light, sheet resistance 4.1 Ω/sq) and strong EMI shielding effectiveness (average shielding effectiveness 33.6 dB at 1-18 GHz), showcasing their potential as a scalable and effective transparent EMI shielding solution.