Basic research on chemical mechanical polishing of single-crystal SiC—Electro–Fenton: Reaction mechanism and modelling of hydroxyl radical generation using condition response modelling
Jiayun Deng, Jiabin Lu, Qiusheng Yan, Jisheng Pan
Topics & Concepts
PolishingAnodeChemistryHydroxyl radicalRadicalCrystal (programming language)CatalysisCathodeReaction mechanismChemical engineeringMaterials scienceAnalytical Chemistry (journal)ElectrodeMetallurgyPhysical chemistryChromatographyOrganic chemistryEngineeringProgramming languageComputer scienceSemiconductor materials and devicesAdvanced Photocatalysis TechniquesAdvanced oxidation water treatment