Deviations between film and target compositions induced by backscattered Ar during sputtering from M2-Al-C (M = Cr, Zr, and Hf) composite targets
Yu‐Ping Chien, Stanislav Mráz, Matej Fekete, Marcus Hans, Daniel Primetzhofer, S. Kolozsvári, P. Polcik, Jochen M. Schneider
Topics & Concepts
Materials scienceSputteringComposite numberComposite materialAnalytical Chemistry (journal)MetallurgyThin filmNanotechnologyEnvironmental chemistryChemistryMXene and MAX Phase MaterialsMetal and Thin Film MechanicsBoron and Carbon Nanomaterials Research