Selection of a Suitable Solvent Additive for 2-Methoxyethanol-Based Antisolvent-Free Perovskite Film Fabrication
Sung Hun Lee, Seungyeon Hong, Hyo Jung Kim
Abstract
In this study, we compare various solvents with different Gutmann donor numbers as additives to improve the quality of perovskite films via an antisolvent-free process, using 2-methoxyethanol (2MOE) as the solvent. In 2MOE-based solutions, we found that the higher the donor number of the solvent, the lower the amount of the solvent required to form insoluble adducts. Furthermore, we found that N-methyl-2-pyrrolidone (NMP), which has a relatively low donor number and vapor pressure, can be added without a limitation to precipitation, while the degree of the intermediate phase in the as-deposited film is controlled by the amount of NMP added. We obtained pinhole-free and planar perovskite films by optimizing the amount of NMP added and fabricated devices based on NMP-assisted MAPbI3 and MAPbI3–xClx films, with efficiencies of 18.80 and 20.39%, respectively.