Study on particle removal during the Co post-CMP cleaning process
Yuanshen Cheng, Shengli Wang, Hongliang Li, Chenwei Wang, Yundian Yang, Shuangshuang Lei, Sen Li
Topics & Concepts
WettingZeta potentialX-ray photoelectron spectroscopyChemical-mechanical planarizationContact angleMaterials scienceChemical engineeringScanning electron microscopeParticle (ecology)NanotechnologyChemistryPolishingComposite materialNanoparticleEngineeringOceanographyGeologyAdvanced Surface Polishing TechniquesMinerals Flotation and Separation TechniquesPolymer Surface Interaction Studies