Zr <sub>55</sub> Al <sub>10</sub> Ni <sub>5</sub> Cu <sub>30</sub> amorphous alloy film prepared by magnetron sputtering method
Dong-Mei Mi, Shengli Zhu, Yan‐Qin Liang, Zhaoyang Li, Zhenduo Cui, Xianjin Yang, Akihisa Inoue
Abstract
Abstract In this work, amorphous Zr 55 Al 10 Ni 5 Cu 30 alloy thin film was prepared on D36 steel substrate by magnetron sputtering method. The film was characterized by scanning electron microscopy (SEM), X‐ray diffraction (XRD), atomic force microscopy (AFM), hardness tester and nano indentation. Corrosion behavior of the film was investigated in 3.5% NaCl aqueous solutions by an electrochemical method. At room temperature, the amorphous alloy film was formed completely after sputtering for 5 h. The surface morphology of the amorphous alloy film was uniform and smooth. Formation of the amorphous alloy film improved the microhardness and corrosion resistance of the D36 substrate. The amorphous alloy film (prepared at room temperature for 5 h) exhibited good adhesion strength with the substrate. The as‐sputtered sample exhibited a crevice corrosion trend when the sputtering time was too short (1 h) or too long (10 h).