Investigation of the removal mechanism in amorphous carbon chemical mechanical polishing for achieving an atomic-scale roughness
Ziyang Wang, Pengzhan Liu, Seunghwan Lee, Jin-Hyoung Lee, Hyeonjeong Lee, Hyunho Kim, Seungjun Oh, Taesung Kim
Topics & Concepts
Atomic unitsPolishingChemical-mechanical planarizationMaterials scienceAmorphous solidAmorphous carbonCarbon fibersAtomic force microscopySurface finishSurface roughnessMechanism (biology)Scale (ratio)MetallurgyNanotechnologyChemical engineeringComposite materialChemistryCrystallographyComposite numberEngineeringPhysicsQuantum mechanicsAdvanced Surface Polishing TechniquesDiamond and Carbon-based Materials ResearchMetal and Thin Film Mechanics