Advanced XPS-Based Techniques in the Characterization of Catalytic Materials: A Mini-Review
Yuanyuan Cui, Yifan Liao, Youbao Sun, Wenchang Wang, Jinqi Wu, Wei‐Lin Dai, Taohong Huang
Abstract
X-ray photoelectron spectroscopy (XPS) technology is extensively applied in the field of catalysts, offering deep insights into their electronic structures and chemical composition. The development of advanced techniques based on XPS instrumentation allows for a deeper and more holistic exploration of the characteristics of catalytic materials. This mini-review introduces and summarizes the primary applications of XPS-based analysis methods, including ion scattering spectroscopy (ISS) for analyzing single atomic layers, angle-resolved XPS, high energy X-ray sources and argon ion sputtering, each providing different depths of information about a sample. It also summarizes the use of inert atmosphere transfer devices and high-temperature reactors for quasi in situ monitoring as well as the integration of in situ techniques, including light irradiation XPS, to study catalysts’ behavior under realistic conditions.