Enhanced chemical mechanical polishing (CMP) performance of porous self-assembled spherical cerium oxide via RE(La/Pr/Nd) doping
Zhenyu Zhang, Ning Wang, Xingzi Wang, Zheng Zhao, Dong Chen, Xianmin Tan, Yuanyuan Zheng, Zongyu Feng, Xiangxi Zhong, Juanyu Yang, Xiaowei Huang
Topics & Concepts
Chemical-mechanical planarizationCerium oxideMaterials sciencePorosityCeriumDopingPolishingChemical engineeringOxideMechanical strengthComposite materialMetallurgyOptoelectronicsEngineeringCatalytic Processes in Materials ScienceSemiconductor materials and devicesZnO doping and properties